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Overview

Thermal Chemical Vapor Deposition

The main Thermal CVD technology involves adding gases to the pressurized reactor at high temperature of about 1,000℃ where thin film is synthesized onto substrates.

Proven Technology

Graphene Square’s Thermal CVD systems are equipped with strong and reliable hardware materials and components which has been accepted by many universities and research firms throughout the world as the equipment of choice in reaching their 2D materials research goals.

VIEW CVD EQUIPMENT

System Overview

TCVD-50B
  1. 1. 2-Inch Table-Top fully manual to semi-automatic Thermal CVD
  2. 2. The most ideal system for researchers who are limited in budget.
  3. 3. Able to perform high quality graphene synthesis at low cost.
  4. 4. For those research labs with limited space.
  5. 5.Recommend this system for training or laboratory classes
 TCVD-100A
  1. 1. Standard 4-Inch Thermal CVD System with a Safety Cabinet
  2. 2. Very sophisticated and cost effective
  3. 3. Equipped with semi-automatic or fully programmable gas-flow temperature control modules
  4. 4. The most ideal equipment for the synthesis of high quality graphene h-BNs, easily extended to various 2D materials synthesis
  5. 5. Safety cabinet that covers the whole system protects users from hazardous event
  6. 6. For labs with highly sensitive gas safety
    restrictions and high safety conditions.
 TCVD-D100A
  1. 1. 4-Inch Automatic Dual-Furnace CVD System for TMDC Synthesis
  2. 2. The computer-aided controlling module promises the reliable growth condition for multiple users
  3. 3. The movable dual furnace system enables fast heating fast cooling
  4. 4. The safety housing with emergency alarm/stop functions
  5. 5. Appropriate system for research firms and university labs.
TCVD-RF100CA
  1. 1. Premium Custom-Designed System for TMDC & h-BN
  2. 2.Capable for diverse TMDC synthesis / made for high quality, durable operation, consistent and safe synthesis of graphene and other 2D materials.
  3. 3. For labs with high safety concerns, highly sensitive gas safety restrictions / business
    application possible.
  4. 4. Able to use exhaust hoods.
  5. 5. Demo Sites in IBM Zurich Nanotech Center and Seoul National University Graphene Research Center
 TCVD-DRF100CA
  1. 1. Premium Custom-Designed System for TMDC & h-BN
  2. 2. Capable for diverse TMDC synthesis / made for high quality, durable operation, consistent and safe synthesis of graphene and other 2D materials.
  3. 3. For labs with high safety concerns, highly sensitive gas safety restrictions / business application possible.
  4. 4. Able to use exhaust hoods.
  5. 5. Demo Sites in IBM Zurich Nanotech Center and Seoul National University Graphene Research Center
 TCVD-V200A
  1. 1. Capable of large scale, high quality and mass production of graphene synthesis.
  2. 2. Targeted for industrial research institute and commercialization of CVD graphene.

Specifications

TCVD-50B TCVD-100A TCVD-D100CA TCVD-RF100CA TCVD-DRF100CA
Size
Width 1500mm Width 1750mm Width 2300mm Width 2300mm Width 2300mm
Height 893mm Height 1585mm Height 1770mm Height 1770mm Height 1770mm
Depth 590mm Depth 750mm Depth 750mm Depth 750mm Depth 750mm
Features
Economic & space -saving model. Advanced Semi-Auto System Advanced Computer Controlled Automatic System Up to 10 gases 3 MO sources for gas-phase synthesis. Up to 10 gases 3 MO sources for gas-phase synthesis.
Optimized for graphene, CNT, h-BN, TMDC growth. Optimized for graphene, CNT, h-BN, TMDC growth Optimized for graphene, CNT, h-BN TMDC growth Motor-controlled movable heater for fast heating fast cooling (patented). Motor-controlled movable heater for fast heating fast cooling (patented).
Water-cooled end chambers and doors. Water-cooled end chambers and doors. Water-cooled end chambers and doors. Fully computer-controlled programmable recipes. Fully computer-controlled programmable recipes.
Process Temperature : ~1,100℃ Process Temperature : ~1,100°C Process Temperature : ~1,100ºC TCVD100 platform : Proven performance for ~100 systems for more than 5 years. TCVD100 platform : Proven performance for ~100 systems for more than 5 years.
Protective design from heat - - Invited training for full sample preparation processes. Invited training for full sample preparation processes from synthesis, etching, transfer.
Uniformity of Film Thickness : ≤+-3% Uniformity of Film Thickness : ≤+-3% Uniformity of Film Thickness : ≤+-3% - Supply of high-quality source materials.
Testing Uniformity : ≤+-3% Testing Uniformity : ≤+-3% Testing Uniformity : ≤+-3% - 1 year warranty included (2 year extended warranty available)
Movable furnace method is our unique knowhow for fast heating fast cooling of the sample Movable furnace method is our unique knowhow for fast heating fast cooling of the sample Movable furnace method is our unique knowhow for fast heating fast cooling of the sample - CVD chambers connected to a Glove Box. Free from air exposure.
- Standard safety box Standard safety box
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